Gas abatement apparatus

ABSTRACT

Embodiments of the present disclosure relate to gas abatement apparatus and effluent management. The apparatus described herein include a high pressure process chamber and a containment chamber surrounding the process chamber. A high pressure fluid delivery module is in fluid communication with the high pressure process chamber and is configured to deliver a high pressure fluid to the process chamber. An effluent management module includes a muffler assembly to effluent pressure reduction and a plurality of scrubbers provide for treatment of effluent.

CROSS-REFERENCE TO RELATED APPLICATIONS

This application is a continuation of and claims benefit to U.S. patentapplication Ser. No. 16/055,929, filed Aug. 6, 2018, the entirety ofwhich is hereby incorporated by reference.

BACKGROUND Field

Embodiments of the present disclosure generally relate to apparatus forsemiconductor processing. More specifically, embodiments of thedisclosure relate to gas abatement apparatus for high pressureprocessing systems.

Description of the Related Art

The field of semiconductor manufacturing utilizes various processes tofabricate devices which are incorporated into integrated circuits. Asdevice complexity increases, integrated circuit manufacturers look forimproved methodologies to fabricate advanced node devices. For example,advanced processing characteristics may include the utilization of moreextreme process variables to enable advanced device fabrication.

One example of a process variable which is increasingly beinginvestigated for utilization in semiconductor manufacturing is highpressure processing. High pressure processing at pressures elevatedabove atmospheric pressure has shown promising material modulationcharacteristics. However, apparatus suitable for safely and efficientlyperforming high pressure processing is often lacking when consideringthe requisite degree of control desired to perform advanced node devicefabrication processes. More specifically, conventional processingapparatus often lack suitable exhaust modules for high pressuremanagement of effluent, such as toxic gases and the like.

Accordingly, what is needed in the art are improved gas abatementapparatus and methods for managing high pressure effluent.

SUMMARY

In one embodiment, a muffler assembly apparatus is provided. Theapparatus includes a first muffler defining a first volume therein, thefirst muffler having a first port formed in a first end and a secondport formed in a second end opposite the first port. A second mufflerdefines a second volume therein. The second muffler has a third portformed in a third end and a fourth port formed in the second mufflersubstantially opposite the third port. A third muffler defines a thirdvolume therein. The third muffler has a fifth port formed therein and asixth port formed therein substantially opposite the fifth port. Afourth muffler defines a fourth volume therein. The fourth muffler has aseventh port formed therein and an eighth port formed through a fourthend substantially opposite the seventh port. A first conduit extendsbetween the seventh port and the fifth port and a second conduit extendsbetween the fourth port and the sixth port.

In another embodiment, an effluent management apparatus is provided. Theapparatus includes a muffler assembly which includes a first mufflerdefining a first volume therein, the first muffler having a first portformed in a first end and a second port formed in a second end oppositethe first port. A second muffler defines a second volume therein. Thesecond muffler has a third port formed in a third end and a fourth portformed in the second muffler substantially opposite the third port. Athird muffler defines a third volume therein. The third muffler has afifth port formed therein and a sixth port formed therein substantiallyopposite the fifth port. A fourth muffler defines a fourth volumetherein. The fourth muffler has a seventh port formed therein and aneighth port formed through a fourth end substantially opposite theseventh port. A first conduit extends between the seventh port and thefifth port and a second conduit extends between the fourth port and thesixth port. A third conduit extends from the third port to a valve, afirst scrubber is in fluid communication with the valve and a secondscrubber is in fluid communication with the valve via a fourth conduit.

In yet another embodiment, a high-pressure processing apparatus isprovided. The apparatus includes a first chamber and a second chamberdefining a process volume therein. The second chamber is disposed withinthe first chamber. A muffler assembly includes a first muffler defininga first volume therein, the first muffler having a first port formed ina first end and a second port formed in a second end opposite the firstport. A second muffler defines a second volume therein. The secondmuffler has a third port formed in a third end and a fourth port formedin the second muffler substantially opposite the third port. A thirdmuffler defines a third volume therein. The third muffler has a fifthport formed therein and a sixth port formed therein substantiallyopposite the fifth port. A fourth muffler defines a fourth volumetherein. The fourth muffler has a seventh port formed therein and aneighth port formed through a fourth end substantially opposite theseventh port. A first conduit extends between the seventh port and thefifth port and a second conduit extends between the fourth port and thesixth port. A third conduit extends from the third port to a valve, afirst scrubber is in fluid communication with the valve and a secondscrubber is in fluid communication with the valve via a fourth conduit.A fifth conduit is disposed between the process volume and the firstport of the first muffler.

BRIEF DESCRIPTION OF THE DRAWINGS

So that the manner in which the above recited features of the presentdisclosure can be understood in detail, a more particular description ofthe disclosure, briefly summarized above, may be had by reference toembodiments, some of which are illustrated in the appended drawings. Itis to be noted, however, that the appended drawings illustrate onlyexemplary embodiments and are therefore not to be considered limiting ofits scope, may admit to other equally effective embodiments.

FIG. 1 is a schematic illustration of a high pressure processingapparatus according to an embodiment described herein.

FIG. 2 is a schematic illustration of an effluent management moduleaccording to an embodiment described herein.

FIG. 3 is a schematic, cross-sectional illustration of a mufflerassembly according to an embodiment described herein.

To facilitate understanding, identical reference numerals have beenused, where possible, to designate identical elements that are common tothe figures. It is contemplated that elements and features of oneembodiment may be beneficially incorporated in other embodiments withoutfurther recitation.

DETAILED DESCRIPTION

Embodiments of the present disclosure relate to high pressure processingapparatus for semiconductor processing. The apparatus described hereininclude a high pressure process chamber and a containment chambersurrounding the process chamber. A high pressure fluid delivery moduleis in fluid communication with the high pressure process chamber and isconfigured to deliver a high pressure fluid to the process chamber.

FIG. 1 is a schematic illustration of a high pressure processingapparatus 100 according to an embodiment described herein. The apparatus100 includes a first chamber 116 which defines a first volume 118therein. In one embodiment, a volume of the first volume 118 is betweenabout 80 liters and about 150 liters, for example, between about 100liters and about 120 liters. The first chamber 116 is fabricated from aprocess compatible material, such as aluminum, stainless steel, alloysthereof, and combinations thereof. The material selected for fabricationof the first chamber 116 is suitable for operation at sub-atmosphericpressures, for example pressures less than about 700 Torr, such as 650Torr or less.

An effluent management module 115 is coupled to and in fluidcommunication with the first chamber 116. The first chamber 116 has anexhaust port 128 formed therein. An exhaust conduit 103 is coupled tothe first chamber 116 at the exhaust port 128 such that the exhaustconduit 103 is in fluid communication with the first volume 118. Anisolation valve 105 and a throttle valve 107 are disposed on the exhaustconduit 103. The isolation valve 105 is disposed on the exhaust conduit103 between the throttle valve 107 and the exhaust port 128. Theisolation valve 105 is operable to initiate and extinguish fluidcommunication between the first volume 118 and an exhaust 113. Thethrottle valve 107 controls a flow rate of effluent flowing through theexhaust conduit 103 from the first volume 118.

A pump 109 is also coupled to the exhaust conduit 103 and the pump 109operates to pull fluid from the first volume 118 to the exhaust 113. Thepump 109 is disposed on exhaust conduit 103 between the throttle valve107 and the exhaust 113. In one embodiment, the pump 109 generates asub-atmospheric pressure in the first volume 118, such as a pressureless than about 700 Torr. A scrubber 111 is also disposed on the exhaustconduit 103 between the pump 109 and the exhaust 113. The scrubber 111is in fluid communication with the first volume 118 via the exhaustconduit 103 and the scrubber 111 is configured to treat effluent fromthe first volume 118 prior to the effluent exiting the exhaust conduit103 to the exhaust 113.

The first chamber 116 has an external surface 124 which is not exposedto the first volume 118. A first slit valve 120 is formed in the chamber116 to enable ingress and egress of a substrate therethrough. A firstslit valve door 122 is coupled to the external surface 124 adjacent tothe first slit valve 120. In operation, the first slit valve door 122 isopened to enable passage of the substrate therethrough and closes priorto processing of the substrate.

A second chamber 102 is disposed within the first volume 118 defined bythe first chamber 116. The second chamber 102 defines a second volume104 therein. Similar to the first chamber 116, the second chamber 102 isfabricated from a process compatible material, such as aluminum,stainless steel, alloys thereof, and combinations thereof. In oneembodiment, the second chamber 102 is fabricated from a nickelcontaining steel alloy, for example, a nickel molybdenum containingsteel alloy or a nickel chromium molybdenum containing steel alloy. Thematerial selected for fabrication of the second chamber 102 is suitablefor operation of the second volume 104 at high pressures, such asgreater than about 30 bar, for example, about 50 bar or greater.

A pedestal 106 is disposed in the second chamber 102 and the pedestal106 has a substrate support surface 108 for supporting a substratethereon during processing. In one embodiment, the pedestal 106 includesa resistive heater operable of maintaining a temperature of a substratedisposed on the substrate support surface 108 at a temperature of up toabout 550° C. Although not illustrated, a stem of the pedestal 106extends through the second chamber 102 and the first chamber 116. Thestem of the pedestal 106 may be isolated from the first volume 118 by abellows assembly which is operable isolate the pedestal 106 from thefirst volume 118.

A second slit valve 110 is formed through the second chamber 102 toenable ingress and egress of the substrate therethrough. The second slitvalve 110 is substantially aligned in approximately the same plane asthe first slit valve 120. A second slit valve door 112 is coupled to aninternal surface 114 of the second chamber 102 adjacent to the secondslit valve 110. The positioning of the second slit valve door 112 on theinternal surface 114 enables more secure sealing of the second volume104 during high pressure processing because the high pressure maintainedwithin the second volume 104 urges the second slit valve door 112against the internal surface 114 to create a substantially air tightseal. In operation, the second slit valve door 112 is opened to enablepassage of the substrate from the first slit valve 120. After thesubstrate is positioned on the substrate support surface 108 of thepedestal 106, the second slit valve door 112 closes prior to processingof the substrate.

A fluid management apparatus 140 is configured to deliver one or morefluids to the second volume 104 of the second chamber 102. The fluidmanagement apparatus 140 includes a first fluid delivery module 144, asecond fluid delivery module 142, and a third fluid delivery module 146.The first fluid delivery module 144 is operable to generate steam anddeliver steam to the second volume 104. The first fluid delivery module144 is in fluid communication with a first fluid source 150. In oneembodiment, the first fluid source 150 is a water source, and morespecifically, a deionized water source. The second fluid delivery module142 is in fluid communication with a second fluid source 152. In oneembodiment, the second fluid source 152 is a hydrogen source, and morespecifically, an H₂ source. The third fluid delivery module 146 is influid communication with a third fluid source 148. In one embodiment,the third fluid source 148 is a nitrogen gas source, for example, anammonia source.

The first fluid delivery module 144 is in fluid communication with thesecond volume 104 via a first conduit 156. A valve 164 is disposedbetween the first fluid delivery module 144 and the first conduit 156.The valve 164 is operable to enable fluid flow from the first fluiddelivery module 144 through the first conduit 156. A containmentenclosure 166 surrounds the valve 164 and the connections of the valve164 between the first fluid delivery module 144 and the first conduit156. The first conduit 156 extends from the first valve 164 through thefirst chamber 116, the first volume 118, and the second chamber 102 to aport 132 formed on the internal surface 114 of the second chamber 102.In one embodiment, a heater jacket 157 surrounds the first conduit 156and extends along a length of the first conduit 156 between the valve164 and the first chamber 116.

The second fluid delivery module 142 is in fluid communication with thesecond volume 104 via a second conduit 154. A valve 160 is disposedbetween the second fluid delivery module 142 and the second conduit 154.The valve 160 is operable to enable fluid flow from the second fluiddelivery module 142 through the second conduit 154. A containmentenclosure 162 surrounds the valve 160 and the connections of the valve160 between the second fluid delivery module 142 and the second conduit154. The second conduit 154 extends from the second valve 160 throughthe first chamber 116, the first volume 118, and the second chamber 102to a port 130 formed on the internal surface 114 of the second chamber102. In one embodiment, a heater jacket 155 surrounds the second conduit154 and extends along a length of the second conduit 154 between thevalve 160 and the first chamber 116.

The third fluid delivery module 146 is in fluid communication with thesecond volume 104 via a third conduit 158. A valve 168 is disposedbetween the third fluid delivery module 146 and the third conduit 158.The valve 168 is operable to enable fluid flow from the third fluiddelivery module 146 through the third conduit 158. A containmentenclosure 170 surrounds the valve 168 and the connections of the valve168 between the third fluid delivery module 146 and the third conduit158. The third conduit 158 extends from the third valve 168 through thefirst chamber 116, the first volume 118, and the second chamber 102 to aport 134 formed on the internal surface 114 of the second chamber 102.In one embodiment, a heater jacket 159 surrounds the third conduit 158and extends along a length of the third conduit 158 between the valve168 and the first chamber 116.

Each of the heater jackets 155, 157, 159 are operable to maintain atemperature of a respective conduit 154, 156, 158 at about 300° C. orgreater, for example. 350° C. or greater. In one embodiment the heaterjackets 155, 157, 159 comprise resistive heaters. In another embodiment,the heater jackets 155, 157, 159 comprise fluid channels though which aheated fluid is flowed. By maintaining the conduits 154, 156, 158 atelevated temperatures, steam and other high pressure fluids maintaindesirable property characteristics during transfer from the respectivefluid delivery modules 142, 144, 146 to the second volume 104. In oneexample, steam generated in the fluid delivery module 144 is maintainedin the conduit 156 at elevated temperatures by the heater jacket 157 toprevent or substantially reduce the probability of condensation duringsteam transfer.

The apparatus 100 also includes a purge gas source 172. In oneembodiment, the purge gas source 172 is an inert gas source, such as anitrogen source or a noble gas source. The purge gas source 172 is influid communication with the first volume 118. A conduit 174 extendsfrom the purge gas source 172 to a port 126 formed in the first chamber116. The fluid communication between the purge gas source 172 and thefirst volume 118 enables the first volume 118 to be purged with an inertgas. It is contemplated that the first volume 118 is a containmentvolume that functions as a failsafe should the second volume 104experience an unplanned depressurization event. By having a sufficientlylarge volume to function as an expansion volume and by having purge gascapability, the first volume 118 enables improved safety of operation ofthe second chamber 102 at elevated pressures.

The purge gas source 172 is also in fluid communication with each of theconduits 156, 154, 158. A conduit 176 extends from the purge gas source172 to each of the valves 160, 164, 168. When the valves 160, 164, 168are opened to receive purge gas from the purge gas source 172 flowingthrough the conduit 176, the conduits 154, 156, 158 are purged toeliminate fluids in the conduits 154, 156, 158 that were previouslydelivered from the fluid delivery modules 142, 144, 146. The fluidcommunication between the purge gas source 172 and the conduits 154,156, 158 also enables purging of the second volume 104.

To remove fluids from the second volume 104, an exhaust port 136 isformed in the second chamber 102. A conduit 180 extends from the exhaustport 136 to a regulator valve 184 which is configured to enable apressure drop across the regulator valve 184. In one embodiment,pressurized fluid exhausted from the second volume 104 travels throughthe exhaust port 136, through the conduit 180, and through a valve 182to the regulator valve 184 where a pressure of the fluid is reduced fromgreater than about 30 bar, such as about 50 bar, to between about 0.5bar to about 3 bar. The valve 182 is disposed inline with the regulatorvalve 184 and enables transfer of the reduced pressure fluid from theconduit 180 to a conduit 188.

A pressure relief port 138 is also formed in the second chamber 102. Aconduit 186 extends from the pressure relief port 138 to the conduit 188and the conduit 186 is coupled to the conduit 188 downstream of theregulator valve 184 and the valve 182. The pressure relief port 138 andconduit 186 are configured to bypass the regulator valve 184 andfunction as a secondary pressure reduction for the second volume 104. Avalve 196 is disposed on the conduit 188 downstream from the conduit186, the regulator valve 184, and the valve 182. The valve 196 functionsto enable fluid flow from the second volume 104 via the pressure reliefport 138 without passing through the regulator valve 184. Accordingly,the second volume 104 has a bifurcated pressure relief architecture,first through the exhaust port 136, the conduit 180, and the regulatorvalve 184, and second, through the pressure relief port 138 and theconduit 186. It is believed that the bifurcated pressure reliefarchitecture enables improved control of the pressures generated in thesecond volume 104.

A conduit 190 is coupled to and extends from the conduit 188 between thevalve 184 and the valve 196. More specifically, the conduit 190 iscoupled to the conduit 188 downstream of a location where the conduit186 is coupled to the conduit 188. A valve 192 is disposed on theconduit 190 and is operable to enable selective fluid communicationbetween the second volume 104 and a steam trap 194. The steam trap 194is configured to condense steam released from the second volume 104 whenhigh pressure steam processes are performed in the second volume 104. Inone embodiment, the steam trap 194 is in fluid communication with thesecond volume 104 via the conduits 190, 188, and 186 when the valve 192is opened and the valve 182 is closed. The steam trap 194 may alsofunction as a secondary pressure reduction apparatus for high pressuresteam released from the second volume 104.

A containment enclosure 198 is coupled to the first chamber 116 and eachof the regulator valve 184, the valve 182, the valve 196, and the valve192 are disposed within the containment enclosure 198. The conduits 188,190 are disposed within the containment enclosure 198 and at least aportion of each of the conduits 180, 186 is disposed within thecontainment enclosure 198. In one embodiment, the steam trap 194 isdisposed within the containment enclosure 198. In another embodiment,the steam trap 194 is disposed outside of the containment enclosure 198.

A sensor 121 is coupled to the containment enclosure 198 and in fluidcommunication with the volume defined within the containment enclosure198. The sensor 121 is configured to detect leakage of a gas within thecontainment enclosure volume. In one embodiment, the sensor 121 is anammonia detector. In another embodiment, the sensor 121 is a hydrogendetector. In certain embodiments, the sensor 121 includes multiplesensors, for example, an ammonia detector and a hydrogen detector. Thecontainment enclosure 198 is configured to isolate and contain anyleakage of effluent exhausted from the second volume 104. If leakage ofeffluent, such as the gases described above, is detected, the volumedefined by the containment enclosure 198 is purged by an inert gas froma gas source 131. In one embodiment, the gas source 131 is configured todeliver nitrogen to the volume defined by the containment enclosure 198.Effluent leaked into the volume is exhausted from the containmentenclosure 198. In this embodiment, the containment enclosure 198 volumeis in fluid communication with the scrubber 111 to enable treatment ofeffluent constrained within the containment enclosure 198 when theeffluent is exhausted from the containment enclosure 198.

When the valve 196 is opened, fluid from the conduit 188 travels to aconduit 101 which is in fluid communication with the effluent managementmodule 115. The effluent management module 115, which treats and managesexhaust from both of the first volume 118 and the second volume 104, isdescribed in greater detail with regard to FIG. 2.

FIG. 2 is a schematic illustration of the effluent management module 115according to an embodiment described herein. The module 115 includes theexhaust conduit 103, the isolation valve 105, the throttle valve 107,the pump 109, the scrubber 111, and the exhaust 113 as described abovewith regard to FIG. 1. The module 115 also includes a muffler assembly202. The muffler assembly 202 is in fluid communication with the secondvolume 104 via the conduit 101. The muffler assembly 202 includes aplurality of mufflers 204, 208, 212, 216 which are operable to reduce apressure of effluent flowing through the muffler stack 202.

The muffler assembly 202 includes a first muffler 204 which defines avolume 206, a second muffler 208 which defines a volume 210, a thirdmuffler 212 which defined a volume 214, and a fourth muffler 216 whichdefines a volume 218. The conduit 101 is coupled to and extends betweenthe valve 196 and the first muffler 204. A conduit 220 extends from thefirst muffler 204 opposite the conduit 101 to the exhaust conduit 103.The conduit 220 is coupled to the exhaust conduit 103 between thethrottle valve 107 and the pump 109.

A conduit 222 extends from the pump 109 to the fourth muffler 216. Aconduit 224 extends between the fourth muffler 216 and the third muffler212. A conduit 226 extends between the third muffler 212 and the secondmuffler 208. In operation, effluent flowing through the conduit 101enters the volume 206 of the first muffler 204 and flows through thevolume 206 to the conduit 220. A pressure of the effluent within theconduit is between about 15 psi and about 30 psi. The pressure of theeffluent exiting the volume 206 at the conduit 220 is between about 0psi and about 5 psi. Thus, the first muffler 204 functions as a pressurereduction apparatus which allows the effluent to experience volumetricexpansion to reduce the pressure of the effluent.

The effluent continues from the conduit 220 through the exhaust conduit103 to the pump 109. In some embodiments, effluent from the first volume118 is also present in the exhaust conduit should effluent escape fromthe second volume 104 into the first volume 118. The pump 109 increasesa pressure of the effluent to less than about 16.5 psi, such as betweenabout 5 psi and about 15 psi, to move the effluent through the remainderof the muffler assembly 202. The pump pressurized effluent travelsthrough the conduit 222 to the fourth muffler 216 and expands in thevolume 218. The effluent then flows from the volume 218 through theconduit 224 to the volume 214 of the third muffler 212. The volume 214further reduces the pressure of the effluent and the effluent travelsfrom the volume 214 through the conduit 226 to the volume 210 of thesecond muffler 208. The volume 210 further reduces the pressure of theeffluent such that when the effluent leaves the volume 210 the effluenthas a pressure of less than about 14.5 psi, such as less than about 10psi, for example, between about 0 psi and about 5 psi.

The effluent exits the volume 210 through a conduit 228 which is coupledto and in fluid communication with the volume 210. The conduit 228extends from the second muffler 208 to a bypass valve 230. During normaloperation, the bypass valve 230 enables fluid flow from the conduit 228to the scrubber 111 and exhaust 113. However, should an apparatusfailure occur which results in an unplanned or uncontained release ofeffluent, pressurized or not, the bypass valve 230 is opened whichenables fluid flowing through the module 115 to enter the conduit 232rather than flowing to the scrubber 111. The bypass valve 230 is alsoopened when the scrubber 111 fails to prevent release of untreatedeffluent to the exhaust 113.

The conduit 232 has a flow restrictor 234 disposed thereon which reducesa flow of effluent traveling through the conduit 232. In one embodiment,an amount of NH₃ flowing through the conduit 232 is modulate by the flowrestrictor 234 such that the concentration of NH₃ is less than about 5%by volume, such as less than about 2% by volume. To further facilitateconcentration reduction of the NH₃, the purge gas source 172 is also influid communication with the conduit 232 via a conduit 242. A mass flowcontroller 244 controls the amount of purge gas, such as nitrogen,flowing from the purge gas source 172 through the conduit 242 such thatthe effluent in the conduit 232 is mixed with an appropriate amount ofpurge gas before the effluent travels through a conduit 236 to a secondscrubber 238.

The conduit 236 tees from the intersection of the conduits 232, 242 andextends to the second scrubber 238. The second scrubber 238 treats theeffluent when the bypass valve 230 is opened and the effluent NH₃concentration is modulated to an acceptable amount for treatment. Aftertreatment in the second scrubber 238, the treated effluent travelsthrough a conduit 240 which is in fluid communication between the secondscrubber 238 and the exhaust 113.

FIG. 3 is a schematic, cross-sectional illustration of the mufflerassembly 202 according to an embodiment described herein. As describedabove, the muffler assembly 202 includes the plurality of mufflers 204,208, 212, 216. In one embodiment, the mufflers 204, 208, 212, 216 arefabricated from a stainless steel material or alloys thereof. In anotherembodiment, the mufflers 204, 208, 212, 216 are fabricated from analuminum material or alloys thereof. Each of the mufflers 204, 208, 212,216 defines a respective volume 206, 210, 124, 218 therein. In oneembodiment, each of the mufflers 204, 208, 212, 216 have substantiallysimilar dimensions.

In one embodiment, the muffler 204, 208, 212, 216 are cylindrical. Adiameter 342 of each of the mufflers 204, 208, 212, 216 is between about20 inches and about 40 inches, for example, about 30 inches. A length344 of each of the mufflers 204, 208, 212, 216 is between about 60inches and about 100 inches, such as about 80 inches. In one embodiment,the mufflers 204, 208, 212, 216 are stacked in a substantially verticalarrangement. In one embodiment, the mufflers 204, 208, 212, 216 arestructured by a frame assembly (not shown) to facilitate disposition inthe substantially vertical arrangement. It is also contemplated that themufflers 204, 208, 212, 216 may be disposed in a horizontal arrangementor other arrangements.

The first muffler 204 has a port 302 formed through a first end 346. Inone embodiment, the port 302 is formed through a center region of thefirst end 346. The conduit 101 couples to the port 302 to enable fluidcommunication between the conduit 101 and the volume 206. A port 304 isformed through a second end 348 of the first muffler 204 opposite theport 302. In one embodiment, the port 304 is formed through a centerregion of the second end 348. In operation, effluent enters the volume206 through the port 302 and exits the volume 206 through the port 304.The conduit 220 is coupled to the port 304 to enable fluid communicationbetween the volume 206 and the exhaust conduit 103.

As described above, effluent from the second volume 104 flowssequentially through the first muffler 204, the fourth muffler 216, thethird muffler 212, and the second muffler 208. A port 316 is formed in asecond end 360 of the fourth muffler 216. The conduit 222 is coupled tothe port 316 to enable fluid communication between the pump 109 and thevolume 218. A port 314 is formed through the fourth muffler 216 adjacentto a first end 358 of the fourth muffler 216 opposite the port 316. Inoperation, effluent enters the volume 218 through the port 316 and exitsthe volume 218 through the port 314.

In the aforementioned embodiment, the sequential flow of effluentproceeds from the first muffler 204 to the fourth muffler 216, the thirdmuffler 212, and the second muffler 208. In this embodiment, the volume218 of the fourth muffler 216 is in direct fluid communication with thevolume 214 of the third muffler 212. Similarly, the volume 214 of thethird muffler 212 is in direct fluid communication with the volume 210of the second muffler 208. The volume 206 of the first muffler 204 is inindirect fluid communication with the volume 218 of the fourth muffler216 via the exhaust conduit 103. In alternative embodiments, the directand indirect fluid communication between the various volumes 206, 210,214, 218 may be varied depending upon the desired effluent pressurereduction and/or physical space requirements.

A port 312 is formed in the third muffler 212 adjacent to a first end354 of the third muffler 212. A conduit 224 extends between the port 312and the port 314 to enable fluid communication between the volume 218and the volume 214. A port 310 is formed in the third muffler 212adjacent to a second end 356 of the third muffler 212 opposite the port312. In operation, effluent enters the volume 214 through the port 312and exits the volume 214 through the port 310.

A port 308 is formed in the second muffler 208 adjacent to a second end352 of the second muffler 208. A conduit 226 extends between the port308 and the port 310 to enable fluid communication between the volume214 and the volume 210. A port 306 is formed in the second muffler 208through a first end 350 of the second muffler opposite the port 308. Inone embodiment, the port 306 is formed through a center region of thefirst end 350. In operation, effluent enters the volume 210 through theport 308 and exits the volume 210 through the port 306. The conduit 228is coupled to the port 306 to remove effluent from the volume 210 andtransfer the effluent to other apparatus of the module 115.

Each of the mufflers 204, 208, 212, 216 and the respective fluid inletand outlet ports are disposed opposite one another along the length 344of the mufflers 204, 208, 212, 216 to enable volumetric expansion of theeffluent as the effluent traverses through the volumes 206, 210, 214,218. By enabling the effluent to “see” substantially the entire volumeof each of the mufflers 204, 208, 212, 216 pressure reduction isaccomplished in a more efficient manner.

When the effluent travels through the mufflers 204, 208, 212, 216,condensate or other liquids may accumulate within the volumes 206, 210,214, 218. A port 318 is formed through the second end 348 of the firstmuffler 204 adjacent to the port 304. In one embodiment, the port 318 isformed through the second end 348 radially outward of the port 304. Aconduit 320 is coupled to and extends from the port 318 to a cap 334.When condensate or other fluid accumulates within the volume 206, thecap 334 is removed and the fluid is evacuated from the volume 206 viathe port 318 and conduit 320.

A port 322 is formed through the second end 352 of the second muffler208. In one embodiment, the port 322 is formed through the second end352 radially outward of the port 306. A conduit 324 is coupled to andextends from the port 322 to a cap 336. When condensate or other fluidaccumulates within the volume 210, the cap 336 is removed and the fluidis evacuated from the volume 210 via the port 322 and conduit 324.

A port 326 is formed through the second end 356 of the third muffler212. A conduit 328 is coupled to and extends from the port 326 to a cap338. When condensate or other fluid accumulates within the volume 214,the cap 338 is removed and the fluid is evacuated from the volume 214via the port 326 and conduit 328.

A port 330 is formed through the second end 360 of the fourth muffler216 adjacent to the port 316. In one embodiment, the port 330 is formedthrough the second end 360 radially outward of the port 316. A conduit332 is coupled to and extends from the port 330 to a cap 340. Whencondensate or other fluid accumulates within the volume 218, the cap 340is removed and the fluid is evacuated from the volume 218 via the port330 and conduit 332.

In summation, effluent management apparatus for improving pressurereduction of effluent and for treating effluent are described herein.The muffler assembly enables pressure reduction of effluent utilizedduring high pressure processing operation by sequentially flowing theeffluent through a series of mufflers to enable volumetric expansion(and associated pressure reduction) of the effluent. Apparatus describedherein also include effluent treatment apparatus for standard operationand high pressure processing apparatus and for emergency effluentcontrol in the case of an unplanned or uncontained effluent release.

While the foregoing is directed to embodiments of the presentdisclosure, other and further embodiments of the disclosure may bedevised without departing from the basic scope thereof, and the scopethereof is determined by the claims that follow.

What is claimed is:
 1. A muffler assembly apparatus, comprising: a firstmuffler defining a first volume therein, the first muffler having afirst port formed in a first end and a second port formed in a secondend opposite the first port; a second muffler defining a second volumetherein, the second muffler having a third port formed in a third endand a fourth port formed in the second muffler opposite the third port;a third muffler defining a third volume therein, the third mufflerhaving a fifth port formed therein and a sixth port formed thereinopposite the fifth port; a fourth muffler defining a fourth volumetherein, the fourth muffler having a seventh port formed therein and aneighth port formed through a fourth end opposite the seventh port; afirst conduit extending between the seventh port and the fifth port; asecond conduit extending between the fourth port and the sixth port; anexhaust conduit; a pump coupled to the exhaust conduit; a third conduitextending from the first muffler to the exhaust conduit; and a fourthconduit extending from the pump to the fourth muffler.
 2. The apparatusof claim 1, wherein the each of the first muffler, the second muffler,the third muffler, and the fourth muffler have similar dimensions. 3.The apparatus of claim 2, wherein a length of each of the first muffler,the second muffler, the third muffler, and the fourth muffler is between60 inches and 100 inches.
 4. The apparatus of claim 2, wherein each ofthe first muffler, the second muffler, the third muffler, and the fourthmuffler are cylindrical.
 5. The apparatus of claim 4, wherein a diameterof each of the first muffler, the second muffler, the third muffler, andthe fourth muffler is between 20 inches and 40 inches.
 6. The apparatusof claim 1, further comprising: a ninth port formed in the first muffleradjacent to the second port; a tenth port formed in the second muffleradjacent to the fourth port; an eleventh port formed in the thirdmuffler adjacent to the sixth port; and a twelfth port formed in thefourth muffler adjacent to the eighth port.
 7. An effluent managementapparatus, comprising: a muffler assembly, comprising: a first mufflerdefining a first volume therein; a second muffler defining a secondvolume therein; a third muffler defining a third volume therein; afourth muffler defining a fourth volume therein; a first conduitextending between the fourth muffler and the third muffler; and a secondconduit extending between the second muffler and the third muffler; avalve; a third conduit extending between the second muffler and thevalve; a first scrubber in fluid communication with the valve; and asecond scrubber in fluid communication with the valve via a fourthconduit, wherein a flow restrictor is disposed on the fourth conduitbetween the valve and the second scrubber.
 8. The apparatus of claim 7,wherein each of the first muffler, the second muffler, the thirdmuffler, and the fourth muffler is cylindrical.
 9. The apparatus ofclaim 8, wherein a length of each of the first muffler, the secondmuffler, the third muffler, and the fourth muffler is between 60 inchesand 100 inches.
 10. The apparatus of claim 8, wherein a diameter of eachof the first muffler, the second muffler, the third muffler, and thefourth muffler is between 20 inches and 40 inches.
 11. A high-pressureprocessing apparatus, comprising: a first chamber; a second chamberdefining a process volume therein, the second chamber disposed withinthe first chamber; a muffler assembly, comprising: a first mufflerdefining a first volume therein; a second muffler defining a secondvolume therein; a third muffler defining a third volume therein; afourth muffler defining a fourth volume therein; a first conduitextending between the fourth muffler and the third muffler; and a secondconduit extending between the second muffler and the third muffler; avalve; a third conduit extending between the second muffler and thevalve; a first scrubber in fluid communication with the valve; anexhaust conduit extending from the first chamber; a pump coupled to theexhaust conduit; a fourth conduit extending from the first muffler tothe exhaust conduit; and a fifth conduit extending from the pump to thefourth muffler.
 12. The apparatus of claim 11, further comprising: asecond scrubber in fluid communication with the valve via a sixthconduit; and a seventh conduit disposed between the process volume andthe first muffler.
 13. The apparatus of claim 11, wherein each of thefirst muffler, the second muffler, the third muffler, and the fourthmuffler is cylindrical.
 14. The apparatus of claim 13, wherein a lengthof each of the first muffler, the second muffler, the third muffler, andthe fourth muffler is between 60 inches and 100 inches.
 15. Theapparatus of claim 13, wherein a diameter of each of the first muffler,the second muffler, the third muffler, and the fourth muffler is between20 inches and 40 inches.
 16. The apparatus of claim 11, furthercomprising: a first slit valve formed in the second chamber; and a firstslit valve door coupled to an internal surface of the second chamber.17. The apparatus of claim 16, further comprising: a second slit valveformed in the first chamber; and a second slit valve door coupled to anexternal surface of the first chamber.
 18. An effluent managementapparatus, comprising: a muffler assembly, comprising: a first mufflerdefining a first volume therein; a second muffler defining a secondvolume therein; a third muffler defining a third volume therein; afourth muffler defining a fourth volume therein; a first conduitextending between the fourth muffler and the third muffler; and a secondconduit extending between the second muffler and the third muffler; avalve; a third conduit extending between the second muffler and thevalve; a first scrubber in fluid communication with the valve; anexhaust conduit; a pump coupled to the exhaust conduit; a fourth conduitextending from the first muffler to the exhaust conduit; and a fifthconduit extending from the pump to the fourth muffler.
 19. The apparatusof claim 18, wherein each of the first muffler, the second muffler, thethird muffler, and the fourth muffler is cylindrical.
 20. The apparatusof claim 19, wherein a length of each of the first muffler, the secondmuffler, the third muffler, and the fourth muffler is between 60 inchesand 100 inches.
 21. The apparatus of claim 19, wherein a diameter ofeach of the first muffler, the second muffler, the third muffler, andthe fourth muffler is between 20 inches and 40 inches.
 22. Ahigh-pressure processing apparatus, comprising: a first chamber; asecond chamber defining a process volume therein, the second chamberdisposed within the first chamber; a muffler assembly, comprising: afirst muffler defining a first volume therein; a second muffler defininga second volume therein; a third muffler defining a third volumetherein; a fourth muffler defining a fourth volume therein; a firstconduit extending between the fourth muffler and the third muffler; anda second conduit extending between the second muffler and the thirdmuffler; a valve; a third conduit extending between the second mufflerand the valve; a first scrubber in fluid communication with the valve; afirst slit valve formed in the second chamber; and a first slit valvedoor coupled to an internal surface of the second chamber.
 23. Ahigh-pressure processing apparatus, comprising: a first chamber; asecond chamber defining a process volume therein, the second chamberdisposed within the first chamber; a muffler assembly, comprising: afirst muffler defining a first volume therein; a second muffler defininga second volume therein; a third muffler defining a third volumetherein; a fourth muffler defining a fourth volume therein; a firstconduit extending between the fourth muffler and the third muffler; anda second conduit extending between the second muffler and the thirdmuffler; a valve; a third conduit extending between the second mufflerand the valve; a first scrubber in fluid communication with the valve; afirst slit valve formed in the first chamber; and a first slit valvedoor coupled to an external surface of the first chamber.